Citation: |
Yu Changliang, Mao Luhong, Xiao Xindong, Xie Sheng, Zhang Shilin. An approach to the optical interconnect made in standard CMOS process[J]. Journal of Semiconductors, 2009, 30(5): 055012. doi: 10.1088/1674-4926/30/5/055012
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Yu C L, Mao L H, Xiao X D, Xie S, Zhang S L. An approach to the optical interconnect made in standard CMOS process[J]. J. Semicond., 2009, 30(5): 055012. doi: 10.1088/1674-4926/30/5/055012.
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An approach to the optical interconnect made in standard CMOS process
DOI: 10.1088/1674-4926/30/5/055012
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Abstract
A standard CMOS optical interconnect is proposed, including an octagonal-annular emitter, a field oxide, metal 1-PSG/BPSG–metal 2 dual waveguide, and an ultra high-sensitivity optical receiver integrated with a fingered P+/N-well/P-sub dual photodiode detector. The optical interconnect is implemented in a Chartered 3.3-V 0.35-μm standard analog CMOS process with two schemes for the research of the substrate noise coupling effect on the optical interconnect performance: with or without a GND-guardring around the emitter. The experiment results show that the optical interconnect can work at 100 kHz, and it is feasible to implement optical interconnects in standard CMOS processes.-
Keywords:
- optical interconnect
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References
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Proportional views