Citation: |
Gh. Sareminia, F. Zahedi, Sh. Eminov, Ar. Karamian. Cleaning method of InSb [-1-1-1] B of n-InSb [111] A/B for growth of epitaxial layers by liquid phase epitaxy[J]. Journal of Semiconductors, 2011, 32(5): 056001. doi: 10.1088/1674-4926/32/5/056001
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G Sareminia, F Zahedi, S Eminov, A Karamian. Cleaning method of InSb [-1-1-1] B of n-InSb [111] A/B for growth of epitaxial layers by liquid phase epitaxy[J]. J. Semicond., 2011, 32(5): 056001. doi: 10.1088/1674-4926/32/5/056001.
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Cleaning method of InSb [-1-1-1] B of n-InSb [111] A/B for growth of epitaxial layers by liquid phase epitaxy
DOI: 10.1088/1674-4926/32/5/056001
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Abstract
The crystal structure of InSb [111] A/B surfaces shows that this structure is polarized. This means that the surfaces of InSb [111] A and InSb [1 1 1] B contain two different crystallized directions and they have different physical and chemical properties. Experiments were carried out on the InSb [111] A/B surfaces, showing that tartaric acid etchant could create a very smooth surface on the InSb [1 1 1] B without any traces of oxides and etch pit but simultaneously create etch pit on InSb [111] A surfaces. After lapping and polishing, some particles remained on the InSb [1 1 1] B surface, they could not be removed easily by standard cleaning process and if these particles remain on the surface of the substrate, the growth layer was not uniform and some island-like regions were observed. The purpose of this work is to remove these particles on the InSb [1 1 1] B surface. Some morphology images of both surfaces, InSb [111] A/B, will be presented. -
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