Citation: |
P. Dalapati, N.B. Manik, A.N. Basu. Influence of temperature on tunneling-enhanced recombination in Si based p-i-n photodiodes[J]. Journal of Semiconductors, 2014, 35(8): 082001. doi: 10.1088/1674-4926/35/8/082001
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P. Dalapati, N.B. Manik, A.N. Basu. Influence of temperature on tunneling-enhanced recombination in Si based p-i-n photodiodes[J]. J. Semicond., 2014, 35(8): 082001. doi: 10.1088/1674-4926/35/8/082001.
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Influence of temperature on tunneling-enhanced recombination in Si based p-i-n photodiodes
DOI: 10.1088/1674-4926/35/8/082001
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Abstract
We investigate the dominant dark current transport mechanism in Si based p-i-n photodiodes, namely, BPW 21R, SFH 205FA and BPX 61 photodiodes in the temperature range of 350 to 139 K. The forward current-voltage characteristics of these photodiodes are explained via the tunneling enhanced recombination model, which gives a quantitative description of the electronic mechanism in the p-i-n junction photodiodes. The observed temperature dependence of the saturation current and the diode ideality factor of these devices agree well with theoretical predictions; the analysis also indicates the importance of doping for enhancement of tunneling. The present study will be helpful in applying the devices at low temperature ambience. -
References
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