1 |
Source-field-plated Ga2O3 MOSFET with a breakdown voltage of 550 V
Yuanjie Lü, Xubo Song, Zezhao He, Yuangang Wang, Xin Tan, et al.
Journal of Semiconductors, 2019, 40(1): 012803. doi: 10.1088/1674-4926/40/1/012803
|
2 |
Fabrication of 4H-SiC n-channel IGBTs with ultra high blocking voltage
Xiaolei Yang, Yonghong Tao, Tongtong Yang, Runhua Huang, Bai Song, et al.
Journal of Semiconductors, 2018, 39(3): 034005. doi: 10.1088/1674-4926/39/3/034005
|
3 |
Modeling on oxide dependent 2DEG sheet charge density and threshold voltage in AlGaN/GaN MOSHEMT
J. Panda, K. Jena, R. Swain, T. R. Lenka
Journal of Semiconductors, 2016, 37(4): 044003. doi: 10.1088/1674-4926/37/4/044003
|
4 |
A monolithic integrated low-voltage deep brain stimulator with wireless power and data transmission
Zhang Zhang, Ye Tan, Jianmin Zeng, Xu Han, Xin Cheng, et al.
Journal of Semiconductors, 2016, 37(9): 095003. doi: 10.1088/1674-4926/37/9/095003
|
5 |
Theoretical modification of the negative Miller capacitance during the switching transients of IGBTs
Yuan Teng, Yangjun Zhu, Zhengsheng Han, Tianchun Ye
Journal of Semiconductors, 2016, 37(7): 074005. doi: 10.1088/1674-4926/37/7/074005
|
6 |
An insulated gate bipolar transistor with surface n-type barrier
Mengxuan Jiang, Z. John Shen, Jun Wang, Zhikang Shuai, Xin Yin, et al.
Journal of Semiconductors, 2015, 36(12): 124004. doi: 10.1088/1674-4926/36/12/124004
|
7 |
Experimental and theoretical study of an improved breakdown voltage SOI LDMOS with a reduced cell pitch
Xiaorong Luo, Xiaowei Wang, Gangyi Hu, Yuanhang Fan, Kun Zhou, et al.
Journal of Semiconductors, 2014, 35(2): 024007. doi: 10.1088/1674-4926/35/2/024007
|
8 |
Model development for analyzing 2DEG sheet charge density and threshold voltage considering interface DOS for AlInN/GaN MOSHEMT
Devashish Pandey, T.R. Lenka
Journal of Semiconductors, 2014, 35(10): 104001. doi: 10.1088/1674-4926/35/10/104001
|
9 |
Breakdown voltage and current collapse of F-plasma treated AlGaN/GaN HEMTs
Chong Wang, Chong Chen, Yunlong He, Xuefeng Zheng, Xiaohua Ma, et al.
Journal of Semiconductors, 2014, 35(1): 014008. doi: 10.1088/1674-4926/35/1/014008
|
10 |
Simulating and modeling the breakdown voltage in a semi-insulating GaAs P+N junction diode
A. Resfa, Brahimi.R. Menezla, M. Benchhima
Journal of Semiconductors, 2014, 35(8): 084002. doi: 10.1088/1674-4926/35/8/084002
|
11 |
A voltage regulator system with dynamic bandwidth boosting for passive UHF RFID transponders
Jinpeng Shen, Xin'an Wang, Shan Liu, Shoucheng Li, Zhengkun Ruan, et al.
Journal of Semiconductors, 2013, 34(10): 105004. doi: 10.1088/1674-4926/34/10/105004
|
12 |
A simulation study on a novel trench SJ IGBT
Wang Bo, Tan Jingfei, Zhang Wenliang, Chu Weili, Zhu Yangjun, et al.
Journal of Semiconductors, 2012, 33(11): 114002. doi: 10.1088/1674-4926/33/11/114002
|
13 |
Influence of etching current density on the morphology of macroporous silicon arrays by photo-electrochemical etching
Wang Guozheng, Chen Li, Qin Xulei, Wang Ji, Wang Yang, et al.
Journal of Semiconductors, 2010, 31(7): 074011. doi: 10.1088/1674-4926/31/7/074011
|
14 |
Conductivity modulation enhanced lateral IGBT with SiO2 shielded layer anode by SIMOX technology on SOI substrate
Chen Wensuo, Zhang Bo, Li Zhaoji, Fang Jian, Guan Xu, et al.
Journal of Semiconductors, 2010, 31(6): 064004. doi: 10.1088/1674-4926/31/6/064004
|
15 |
A novel TFS-IGBT with a super junction floating layer
Ye Jun, Fu Daping, Luo Bo, Zhao Yuanyuan, Qiao Ming, et al.
Journal of Semiconductors, 2010, 31(11): 114008. doi: 10.1088/1674-4926/31/11/114008
|
16 |
A 1.8 V LDO voltage regulator with foldback current limit and thermal protection
Liu Zhiming, Fu Zhongqian, Huang Lu, Xi Tianzuo
Journal of Semiconductors, 2009, 30(8): 085007. doi: 10.1088/1674-4926/30/8/085007
|
17 |
Realizing High Breakdown Voltage SJ-LDMOS on Bulk Silicon Using a Partial n-Buried Layer
Chen Wanjun, Zhang Bo, Li Zhaoji
Chinese Journal of Semiconductors , 2007, 28(3): 355-360.
|
18 |
Breakdown Voltage and Charge to Breakdown Investigation of Gate Oxide of 0.18μm Dual Gate CMOS Process with Different Measurement Methods
Zhao Yi, Wan Xinggong, Xu Xiangming, Cao Gang, Bu Jiao, et al.
Chinese Journal of Semiconductors , 2006, 27(2): 290-293.
|
19 |
Low Voltage Flash Memory Cells Using SiGe Quantum Dots for Enhancing F-N Tunneling
Deng Ning, Pan Liyang, Liu Zhihong, Zhu Jun, Chen Peiyi, et al.
Chinese Journal of Semiconductors , 2006, 27(3): 454-458.
|
20 |
On-State Breakdown Model for High Voltage RESURF LDMOS
Fang Jian, Yi Kun, Li Zhaoji, and Zhang Bo(436)
Chinese Journal of Semiconductors , 2005, 26(3): 436-442.
|