Citation: |
Yonghe Chen, Xuefeng Zheng, Jincheng Zhang, Xiaohua Ma, Yue Hao. Monolithically integrated enhancement/depletion-mode AlGaN/GaN HEMTsSRAM unit and voltage level shifter using fluorine plasma treatment[J]. Journal of Semiconductors, 2016, 37(5): 055002. doi: 10.1088/1674-4926/37/5/055002
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Y H Chen, X F Zheng, J C Zhang, X H Ma, Y Hao. Monolithically integrated enhancement/depletion-mode AlGaN/GaN HEMTsSRAM unit and voltage level shifter using fluorine plasma treatment[J]. J. Semicond., 2016, 37(5): 055002. doi: 10.1088/1674-4926/37/5/055002.
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Monolithically integrated enhancement/depletion-mode AlGaN/GaN HEMTsSRAM unit and voltage level shifter using fluorine plasma treatment
DOI: 10.1088/1674-4926/37/5/055002
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Abstract
A GaN-based E/D mode direct-couple logic 6 transistors SRAM unit and a voltage level shifter were designed and fabricated. E-mode and D-mode AlGaN/GaN HEMTs were integrated in one wafer using fluorine plasma treatment and using a moderate AlGaN barrier layer heterojunction structure. The 6 transistors SRAM unit consists of two symmetrical E/D mode inverters and two E-mode switch HEMTs. The output low and high voltage of the SRAM unit are 0.95 and 0.07 V at a voltage supply of 1 V. The voltage level shifter lowers the supply voltage using four Ni-AlGaN Schottky diodes in a series at a positive supply voltage of 6 V and a negative supply voltage of -6 V. By controlling the states of inverter modules of the level shifter in turn, the level shifter offers two channel voltage outputs of -0.5 and -5 V. The flip voltage of the level shifter is 0.76 V. Both the SRAM unit and voltage shifter operate correctly, demonstrating the promising potential for GaN-based E/D mode digital and analog integrated circuits. Several considerations are proposed to avoid the influence of threshold voltage degradation of D-mode and E-mode HEMT on the operation of the circuit.-
Keywords:
- AlGaN/GaN,
- E/D mode,
- SRAM,
- voltage level shifter
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References
[1] [2] [3] [4] [5] [6] [7] [8] [9] [10] [11] [12] [13] -
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