Chin. J. Semicond. > 2006, Volume 27 > Issue 2 > 313-317

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A New CMOS Image Sensor with a High Fill Factor and the Dynamic Digital Double Sampling Technique

Liu Yu and Wang Guoyu

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Abstract: A single CMOS image sensor based on a 0.35μm process along with its design and implementation is introduced.The architecture of an active pixel sensor is used in the chip.The fill factor of a pixel cell can reach 43%,higher than the traditional factor of 30%.Moreover,compared with the conventional method whose fixed pattern noise (FPN) is around 0.5%, a dynamic digital double sampling technique is developed,which possesses simpler circuit architecture and a better FPN suppression outcome.The CMOS image sensor chip is implemented in the 0.35μm mixed signal process of a Chartered by MPW.The experimental results show that the chip operates well,with an FPN of about 0.17%.

Key words: active pixel CMOS image sensor fill factor dynamic digital double sampling fixed pattern noise

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    Received: 20 August 2015 Revised: Online: Published: 01 February 2006

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      Liu Yu, Wang Guoyu. A New CMOS Image Sensor with a High Fill Factor and the Dynamic Digital Double Sampling Technique[J]. Journal of Semiconductors, 2006, 27(2): 313-317. ****Liu Y, Wang G Y. A New CMOS Image Sensor with a High Fill Factor and the Dynamic Digital Double Sampling Technique[J]. Chin. J. Semicond., 2006, 27(2): 313.
      Citation:
      Liu Yu, Wang Guoyu. A New CMOS Image Sensor with a High Fill Factor and the Dynamic Digital Double Sampling Technique[J]. Journal of Semiconductors, 2006, 27(2): 313-317. ****
      Liu Y, Wang G Y. A New CMOS Image Sensor with a High Fill Factor and the Dynamic Digital Double Sampling Technique[J]. Chin. J. Semicond., 2006, 27(2): 313.

      A New CMOS Image Sensor with a High Fill Factor and the Dynamic Digital Double Sampling Technique

      • Received Date: 2015-08-20

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