Chin. J. Semicond. > 1983, Volume 4 > Issue 2 > 181-186
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大面积砷化镓的等离子体氧化及氧化层的AES和XPS分析

张冠生 , 唐厚舜 , 黄杜森 , 余夕同 , 赵国珍 and 钮成法

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    Received: 20 August 2015 Revised: Online: Published: 01 February 1983

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      Article Navigation >  Journal of Semiconductors  > 1983  >  4(2): 181-186
      张冠生, 唐厚舜, 黄杜森, 余夕同, 赵国珍, 钮成法. 大面积砷化镓的等离子体氧化及氧化层的AES和XPS分析[J]. 半导体学报(英文版), 1983, 4(2): 181-186.
      Citation:
      张冠生, 唐厚舜, 黄杜森, 余夕同, 赵国珍, 钮成法. 大面积砷化镓的等离子体氧化及氧化层的AES和XPS分析[J]. 半导体学报(英文版), 1983, 4(2): 181-186.
      shu

      • Received Date: 2015-08-20

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