Chin. J. Semicond. > 2001, Volume 22 > Issue 9 > 1226-1230

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用含表面活性剂和螯合剂的清洗液清洗硅片的研究

曹宝成 , 于新好 , 马瑾 , 马洪磊 and 刘忠立

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Key words: 表面清洗, XPS, 形貌

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    Received: 20 August 2015 Revised: Online: Published: 01 September 2001

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      Article Navigation >  Journal of Semiconductors  > 2001  >  22(9): 1226-1230
      曹宝成, 于新好, 马瑾, 马洪磊, 刘忠立. 用含表面活性剂和螯合剂的清洗液清洗硅片的研究[J]. 半导体学报(英文版), 2001, 22(9): 1226-1230.
      Citation:
      曹宝成, 于新好, 马瑾, 马洪磊, 刘忠立. 用含表面活性剂和螯合剂的清洗液清洗硅片的研究[J]. 半导体学报(英文版), 2001, 22(9): 1226-1230.
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      • Received Date: 2015-08-20

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