Chin. J. Semicond. > 1985, Volume 6 > Issue 1 > 19-24
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硼注入<100>硅残余缺陷的沟道研究

邹世昌 , 倪如山 and 张祖华

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    Received: 20 August 2015 Revised: Online: Published: 01 January 1985

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      Article Navigation >  Journal of Semiconductors  > 1985  >  6(1): 19-24
      邹世昌, 倪如山, 张祖华. 硼注入硅残余缺陷的沟道研究[J]. 半导体学报(英文版), 1985, 6(1): 19-24.
      Citation:
      邹世昌, 倪如山, 张祖华. 硼注入<100>硅残余缺陷的沟道研究[J]. 半导体学报(英文版), 1985, 6(1): 19-24.
      shu

      • Received Date: 2015-08-20

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