| Citation: |
Chen Baoqin, Liu Ming, Xu Qiuxia, Xue Lijun, Li Jinru, Tang Yueke, Zhao Min, Liu Zhuming, Wang Deqiang, Ren Liming, Hu Yong, Long Shibing, 陆晶, Lu Jing, Yang Qinghua, Zhang Lihui. Match and Mixed Lithography Technology Between E-Beam Lithography System and Optical Lithography System[J]. Journal of Semiconductors, 2006, 27(S1): 1-6.
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Chen B Q, Liu M, Xu Q X, Xue L J, Li J R, Tang Y K, Zhao M, Liu Z M, Wang D Q, Ren L M, Hu Y, Long S B, Lu J, Yang Q H, Zhang L H. Match and Mixed Lithography Technology Between E-Beam Lithography System and Optical Lithography System[J]. Chin. J. Semicond., 2006, 27(13): 1.
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Match and Mixed Lithography Technology Between E-Beam Lithography System and Optical Lithography System
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Abstract
This paper described the match & mixed lithography technology between E-beam lithography system and optical lithography system.The following contents are illustrated in detail:(1) Match & mixed lithography technology between E-beam and optical system; (2) Match & mixed lithography technology between stepper and JBX-5000 lithography system; (3) Match & mixed lithography technology between contact printers and JBX-5000LS; (4) Big/small electrical beam current or big/small aperture diaphragm mixed lithography technology; (5) Alignment mark making method in match & mixed lithography technology.The technologies mentioned above have extensively been applied in the fields of micro- and nano- manufacture.As the results,we realized the 20nm line,27nm gate CMOS transistor,50nm island SET,100nm gate HEMT and other nanometer level devices. -
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