Fabrication of a High Quality Etching Mask for Two-Dimensional Photonic Crystal Structures

Du Wei; Xu Xingsheng; Han Weihua; Wang Chunxia; Zhang Yang; Yang Fuhua; Chen Hongda

Article Navigation > Journal of Semiconductors > 2006 > 27(9): 1640-1644

Du Wei, Xu Xingsheng, Han Weihua, Wang Chunxia, Zhang Yang, Yang Fuhua, Chen Hongda. Fabrication of a High Quality Etching Mask for Two-Dimensional Photonic Crystal Structures[J]. Journal of Semiconductors, 2006, 27(9): 1640-1644. ****Du W, Xu X S, Han W H, Wang C X, Zhang Y, Yang F H, Chen H D. Fabrication of a High Quality Etching Mask for Two-Dimensional Photonic Crystal Structures[J]. Chin. J. Semicond., 2006, 27(9): 1640.

Citation:

Du W, Xu X S, Han W H, Wang C X, Zhang Y, Yang F H, Chen H D. Fabrication of a High Quality Etching Mask for Two-Dimensional Photonic Crystal Structures[J]. Chin. J. Semicond., 2006, 27(9): 1640.

Citation:

Du W, Xu X S, Han W H, Wang C X, Zhang Y, Yang F H, Chen H D. Fabrication of a High Quality Etching Mask for Two-Dimensional Photonic Crystal Structures[J]. Chin. J. Semicond., 2006, 27(9): 1640.

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Fabrication of a High Quality Etching Mask for Two-Dimensional Photonic Crystal Structures

Key Laboratory of Integrated Optoelectronics,Institute of Semiconductors,Chinese Academy of Sciences,Beijing 100083,China
Key Laboratory of Integrated Optoelectronics,Institute of Semiconductors,Chinese Academy of Sciences,Beijing 100083,China
Research Center of Semiconductor Integrated Technology,Institute of Semiconductors,Chinese Academy of Sciences,Beijing 100083,China
Key Laboratory of Integrated Optoelectronics,Institute of Semiconductors,Chinese Academy of Sciences,Beijing 100083,China
Research Center of Semiconductor Integrated Technology,Institute of Semiconductors,Chinese Academy of Sciences,Beijing 100083,China
Research Center of Semiconductor Integrated Technology,Institute of Semiconductors,Chinese Academy of Sciences,Beijing 100083,China
Key Laboratory of Integrated Optoelectronics,Institute of Semiconductors,Chinese Academy of Sciences,Beijing 100083,China

Received Date: 2015-08-18
Accepted Date: 2006-03-08
Revised Date: 2006-03-20
Published Date: 2006-10-12

Abstract

Abstract

The influence of different fabrication parameters on polymethyl methacrylate (PMMA) etching mask for two-dimensional photonic crystal structures are studied.The results show that high quality PMMA etching mask can be realized by optimizing parameters such as PMMA thickness,electron beam exposure dose,developing time,and fixation time.
- photonic crystal,
- electron-beam lithography,
- PMMA mask

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