| Citation: |
Wu Yuanda, Xia Junlei, An Junming, Li Jianguang, Wang Hongjie, Hu Xiongwei. Fabrication of Optical Waveguide Devices with UV-Writing Technology[J]. Journal of Semiconductors, 2006, 27(4): 744-746.
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Wu Yuanda, Xia J L, An J M, Li J G, Wang H J, Hu X W. Fabrication of Optical Waveguide Devices with UV-Writing Technology[J]. Chin. J. Semicond., 2006, 27(4): 744.
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Fabrication of Optical Waveguide Devices with UV-Writing Technology
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Abstract
The photosensitivity of commercial Si/SiO2 waveguide materials prepared by PECVD is studied.After exposure to high-pressure hydrogen,the as-deposited films are irradiated with excimer-laser pulses operating at 248nm.The change in the induced relative refractive index is about 0.34%.The sectional index distribution of UV-writing waveguides is investigated in detail.Finally,single-mode optical waveguides and Y-splitters are fabricated from silica-based planar optical waveguides with UV-writing technology with a silicon mask.The test results agree with the simulation results.-
Keywords:
- UV-writing,
- refractive index,
- optical waveguide,
- optical splitter
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References
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