Chin. J. Semicond. > 1982, Volume 3 > Issue 5 > 351-358
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低压化学汽相淀积氮化硅膜的成份和抗氧化能力的测定

曹友琦

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    Received: 20 August 2015 Revised: Online: Published: 01 May 1982

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      Article Navigation >  Journal of Semiconductors  > 1982  >  3(5): 351-358
      曹友琦. 低压化学汽相淀积氮化硅膜的成份和抗氧化能力的测定[J]. 半导体学报(英文版), 1982, 3(5): 351-358.
      Citation:
      曹友琦. 低压化学汽相淀积氮化硅膜的成份和抗氧化能力的测定[J]. 半导体学报(英文版), 1982, 3(5): 351-358.
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      • Received Date: 2015-08-20

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