Chin. J. Semicond. > 1982, Volume 3 > Issue 5 > 359-365
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关于砷化镓自生长氧化膜的研究

刘弘度 , 陈娓兮 and 冯哲川

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    Received: 20 August 2015 Revised: Online: Published: 01 May 1982

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      Article Navigation >  Journal of Semiconductors  > 1982  >  3(5): 359-365
      刘弘度, 陈娓兮, 冯哲川. 关于砷化镓自生长氧化膜的研究[J]. 半导体学报(英文版), 1982, 3(5): 359-365.
      Citation:
      刘弘度, 陈娓兮, 冯哲川. 关于砷化镓自生长氧化膜的研究[J]. 半导体学报(英文版), 1982, 3(5): 359-365.
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      • Received Date: 2015-08-20

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