Chin. J. Semicond. > 1994, Volume 15 > Issue 8 > 524-532
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Co、Ti／Si1－xGex薄膜快速退火固相反应结构和组分研究

亓文杰，李炳宗，黄维宁，顾志光，张翔九，盛篪，胡际璜，吕宏强，卫星，沈孝良

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    Received: 18 August 2015 Revised: Online: Published: 01 August 1994

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      Article Navigation >  Journal of Semiconductors  > 1994  >  15(8): 524-532
      亓文杰，李炳宗，黄维宁，顾志光，张翔九，盛篪，胡际璜，吕宏强，卫星，沈孝良. Co、Ti／Si1－xGex薄膜快速退火固相反应结构和组分研究[J]. 半导体学报(英文版), 1994, 15(8): 524-532.
      Citation:
      亓文杰，李炳宗，黄维宁，顾志光，张翔九，盛篪，胡际璜，吕宏强，卫星，沈孝良. Co、Ti／Si1－xGex薄膜快速退火固相反应结构和组分研究[J]. 半导体学报(英文版), 1994, 15(8): 524-532.
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      • Received Date: 2015-08-18

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