Optimization of Plasma Etching Parameters and Mask for Silica Optical Waveguides

Zhou Libing , Liu Wen and and Wu Guoyang

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Key words: reactive ion etching, silica-on-silicon optical waveguides, 3D neural network

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Received: 19 August 2015 Revised: Online: Published: 01 June 2005

Article Navigation > Journal of Semiconductors > 2005 > 26(6): 1104-1110

Zhou Libing, Liu Wen, and Wu Guoyang. Optimization of Plasma Etching Parameters and Mask for Silica Optical Waveguides[J]. 半导体学报(英文版), 2005, 26(6): 1104-1110.

Citation:

Zhou Libing, Liu Wen, and Wu Guoyang. Optimization of Plasma Etching Parameters and Mask for Silica Optical Waveguides[J]. 半导体学报(英文版), 2005, 26(6): 1104-1110.

Zhou Libing, Liu Wen, and Wu Guoyang. Optimization of Plasma Etching Parameters and Mask for Silica Optical Waveguides[J]. 半导体学报(英文版), 2005, 26(6): 1104-1110.

Citation:

Zhou Libing, Liu Wen, and Wu Guoyang. Optimization of Plasma Etching Parameters and Mask for Silica Optical Waveguides[J]. 半导体学报(英文版), 2005, 26(6): 1104-1110.

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