Chin. J. Semicond. > 2001, Volume 22 > Issue 4 > 476-480
|

CONTENTS

0.1μmT型栅PHEMT器件

郑英奎 , 刘明 , 和致经 and 吴德馨

+ Author Affiliations

PDF

Key words: 二维电子气, 电子束光刻, 混合曝光, PHEMT, T型栅

    • Search

    Advanced Search >>

    GET CITATION

    shu

    Export: BibTex EndNote

    Article Metrics

    Article views: 2234 Times PDF downloads: 1103 Times Cited by: 0 Times

    History

    Received: 20 August 2015 Revised: Online: Published: 01 April 2001

    Catalog

      Email This Article

      User name:
      Email:*请输入正确邮箱
      Code:*验证码错误
      Send
      Article Navigation >  Journal of Semiconductors  > 2001  >  22(4): 476-480
      郑英奎, 刘明, 和致经, 吴德馨. 0.1μmT型栅PHEMT器件[J]. 半导体学报(英文版), 2001, 22(4): 476-480.
      Citation:
      郑英奎, 刘明, 和致经, 吴德馨. 0.1μmT型栅PHEMT器件[J]. 半导体学报(英文版), 2001, 22(4): 476-480.
      shu

      • Received Date: 2015-08-20

      Catalog

        Journal of Semiconductors © 2017 All Rights Reserved   京ICP备05085259号-2

        /

        DownLoad:  Full-Size Img  PowerPoint
        Return
        Return