Chin. J. Semicond. > 2006, Volume 27 > Issue 11 > 1906-1910

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Analysis of Si/GaAs Bonding Stresses with the FiniteElement Method

He Guorong, Yang Guohua, Zheng Wanhua, Wu Xuming, Wang Xiaodong, Cao Yulian, Wang Qing and Chen Lianghui

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Abstract: In conjunction with ANSYS,we use the finite element method to analyze the bonding stresses of Si/GaAs.We also apply a numerical model to investigate a contour map and the distribution of normal stress,shearing stress,and peeling stress,taking into full consideration the thermal expansion coefficient as a function of temperature.Novel bonding structures are proposed for reducing the effect of thermal stress as compared with conventional structures.Calculations show the validity of this new structure.

Key words: bondingthermal stressfinite element analysis

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    Received: 18 August 2015 Revised: Online: Published: 01 November 2006

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      He Guorong, Yang Guohua, Zheng Wanhua, Wu Xuming, Wang Xiaodong, Cao Yulian, Wang Qing, Chen Lianghui. Analysis of Si/GaAs Bonding Stresses with the FiniteElement Method[J]. Journal of Semiconductors, 2006, 27(11): 1906-1910. ****He G R, Yang G H, Zheng W H, Wu X M, Wang X D, Cao Y L, Wang Q, Chen L H. Analysis of Si/GaAs Bonding Stresses with the FiniteElement Method[J]. Chin. J. Semicond., 2006, 27(11): 1906.
      Citation:
      He Guorong, Yang Guohua, Zheng Wanhua, Wu Xuming, Wang Xiaodong, Cao Yulian, Wang Qing, Chen Lianghui. Analysis of Si/GaAs Bonding Stresses with the FiniteElement Method[J]. Journal of Semiconductors, 2006, 27(11): 1906-1910. ****
      He G R, Yang G H, Zheng W H, Wu X M, Wang X D, Cao Y L, Wang Q, Chen L H. Analysis of Si/GaAs Bonding Stresses with the FiniteElement Method[J]. Chin. J. Semicond., 2006, 27(11): 1906.

      Analysis of Si/GaAs Bonding Stresses with the FiniteElement Method

      • Received Date: 2015-08-18

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