Chin. J. Semicond. > 2002, Volume 23 > Issue 2 > 217-221
|

CONTENTS

适于ULSI的一种新的铜的CMP抛光液

王弘英 , 刘玉岭 and 张德臣

+ Author Affiliations

PDF

Key words: 铜, ULSI, 化学机械抛光, 抛光液

    • Search

    Advanced Search >>

    GET CITATION

    shu

    Export: BibTex EndNote

    Article Metrics

    Article views: 2522 Times PDF downloads: 1466 Times Cited by: 0 Times

    History

    Received: 19 August 2015 Revised: Online: Published: 01 February 2002

    Catalog

      Email This Article

      User name:
      Email:*请输入正确邮箱
      Code:*验证码错误
      Send
      Article Navigation >  Journal of Semiconductors  > 2002  >  23(2): 217-221
      王弘英, 刘玉岭, 张德臣. 适于ULSI的一种新的铜的CMP抛光液[J]. 半导体学报(英文版), 2002, 23(2): 217-221.
      Citation:
      王弘英, 刘玉岭, 张德臣. 适于ULSI的一种新的铜的CMP抛光液[J]. 半导体学报(英文版), 2002, 23(2): 217-221.
      shu

      • Received Date: 2015-08-19

      Catalog

        Journal of Semiconductors © 2017 All Rights Reserved   京ICP备05085259号-2

        /

        DownLoad:  Full-Size Img  PowerPoint
        Return
        Return