| Citation: |
Tan Baimei, Niu Xinhuan, Han Lili, Liu Yuling, Cui Chunxiang. Analysis of Factors Affecting CMP Removal Rate of Lithium Niobate[J]. Journal of Semiconductors, 2007, 28(S1): 574-578.
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Tan B M, Niu X H, Han L L, Liu Y L, Cui C X. Analysis of Factors Affecting CMP Removal Rate of Lithium Niobate[J]. Chin. J. Semicond., 2007, 28(S1): 574.
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Analysis of Factors Affecting CMP Removal Rate of Lithium Niobate
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Abstract
In this paper，the CMP mechanism of lithium niobate wafer was analyzed.Improving mass transmission is one of the keys to obtain the perfect surface.Chemical reaction is the controlling factor of CMP process，SO the removal rate of CMP can be improved by enhancing chemical reaction.The experiments had been performed under the condition of different pH.abrasive concentration of polishing slurry，polishing pressure and slurry flow.The influence mechanism of these factors Oil CMP removal rate was analyzed.The optimal CMP process for lithium niobate was gotten·-
Keywords:
- lithium niobate,
- CMP,
- removal rate,
- slurry
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References
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Proportional views
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