Chin. J. Semicond. > 1999, Volume 20 > Issue 5 > 383-388
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硅表面清洗对热氧化13nm SiO_2可靠性的影响

高文钰 , 刘忠立 , 和致经 , 于芳 , 梁桂荣 and 李国花

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    Received: 20 August 2015 Revised: Online: Published: 01 May 1999

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      Article Navigation >  Journal of Semiconductors  > 1999  >  20(5): 383-388
      高文钰, 刘忠立, 和致经, 于芳, 梁桂荣, 李国花. 硅表面清洗对热氧化13nm SiO_2可靠性的影响[J]. 半导体学报(英文版), 1999, 20(5): 383-388.
      Citation:
      高文钰, 刘忠立, 和致经, 于芳, 梁桂荣, 李国花. 硅表面清洗对热氧化13nm SiO_2可靠性的影响[J]. 半导体学报(英文版), 1999, 20(5): 383-388.
      shu

      • Received Date: 2015-08-20

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