Chin. J. Semicond. > 1982, Volume 3 > Issue 3 > 202-207
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偏离<111>晶向的硅表面层中氧化层错的研究

鲍希茂 , 嵇福权 and 黄信凡

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    Received: 20 August 2015 Revised: Online: Published: 01 March 1982

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      Article Navigation >  Journal of Semiconductors  > 1982  >  3(3): 202-207
      鲍希茂, 嵇福权, 黄信凡. 偏离晶向的硅表面层中氧化层错的研究[J]. 半导体学报(英文版), 1982, 3(3): 202-207.
      Citation:
      鲍希茂, 嵇福权, 黄信凡. 偏离<111>晶向的硅表面层中氧化层错的研究[J]. 半导体学报(英文版), 1982, 3(3): 202-207.
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      • Received Date: 2015-08-20

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