Chin. J. Semicond. > 1994, Volume 15 > Issue 1 > 29-34
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一种新的硅深槽刻蚀技术研究

钱钢，张利春，阎桂珍，王咏梅，张大成，王阳元

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    Received: 18 August 2015 Revised: Online: Published: 01 January 1994

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      Article Navigation >  Journal of Semiconductors  > 1994  >  15(1): 29-34
      钱钢，张利春，阎桂珍，王咏梅，张大成，王阳元. 一种新的硅深槽刻蚀技术研究[J]. 半导体学报(英文版), 1994, 15(1): 29-34.
      Citation:
      钱钢，张利春，阎桂珍，王咏梅，张大成，王阳元. 一种新的硅深槽刻蚀技术研究[J]. 半导体学报(英文版), 1994, 15(1): 29-34.
      shu

      • Received Date: 2015-08-18

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