Chin. J. Semicond. > 1996, Volume 17 > Issue 9 > 698-705
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大剂量氧注入硅中的再分布理论及其快速计算

奚雪梅，赵清太，张兴，李映雪，王阳元，陈新，王佑祥

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    Received: 18 August 2015 Revised: Online: Published: 01 September 1996

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      Article Navigation >  Journal of Semiconductors  > 1996  >  17(9): 698-705
      奚雪梅，赵清太，张兴，李映雪，王阳元，陈新，王佑祥. 大剂量氧注入硅中的再分布理论及其快速计算[J]. 半导体学报(英文版), 1996, 17(9): 698-705.
      Citation:
      奚雪梅，赵清太，张兴，李映雪，王阳元，陈新，王佑祥. 大剂量氧注入硅中的再分布理论及其快速计算[J]. 半导体学报(英文版), 1996, 17(9): 698-705.
      shu

      • Received Date: 2015-08-18

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