Chin. J. Semicond. > 2004, Volume 25 > Issue 1 > 109-114
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一种气(Ga)-固(Al掺杂氧化物)-固(Si)掺杂新工艺

刘秀喜 , 孙瑛 and 李玉国

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Key words: 晶闸管, 受主杂质, 掺杂机制, 工艺应用

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    Received: 19 August 2015 Revised: Online: Published: 01 January 2004

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      Article Navigation >  Journal of Semiconductors  > 2004  >  25(1): 109-114
      刘秀喜, 孙瑛, 李玉国. 一种气(Ga)-固(Al掺杂氧化物)-固(Si)掺杂新工艺[J]. 半导体学报(英文版), 2004, 25(1): 109-114.
      Citation:
      刘秀喜, 孙瑛, 李玉国. 一种气(Ga)-固(Al掺杂氧化物)-固(Si)掺杂新工艺[J]. 半导体学报(英文版), 2004, 25(1): 109-114.
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      • Received Date: 2015-08-19

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