Chin. J. Semicond. > 1997, Volume 18 > Issue 2 > 97-102
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用MOCVD方法生长二氧化钛膜的研究

金海岩 and 黄长河

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    Received: 19 August 2015 Revised: Online: Published: 01 February 1997

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      Article Navigation >  Journal of Semiconductors  > 1997  >  18(2): 97-102
      金海岩, 黄长河. 用MOCVD方法生长二氧化钛膜的研究[J]. 半导体学报(英文版), 1997, 18(2): 97-102.
      Citation:
      金海岩, 黄长河. 用MOCVD方法生长二氧化钛膜的研究[J]. 半导体学报(英文版), 1997, 18(2): 97-102.
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      • Received Date: 2015-08-19

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