Chin. J. Semicond. > 1994, Volume 15 > Issue 11 > 795-798

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低温SDB技术研究及硅表面吸附态的影响

焦继伟，陆德仁，王渭源

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    Received: 19 August 2015 Revised: Online: Published: 01 November 1994

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      Article Navigation >  Journal of Semiconductors  > 1994  >  15(11): 795-798
      焦继伟，陆德仁，王渭源. 低温SDB技术研究及硅表面吸附态的影响[J]. 半导体学报(英文版), 1994, 15(11): 795-798.
      Citation:
      焦继伟，陆德仁，王渭源. 低温SDB技术研究及硅表面吸附态的影响[J]. 半导体学报(英文版), 1994, 15(11): 795-798.
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      • Received Date: 2015-08-19

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