Chin. J. Semicond. > 1989, Volume 10 > Issue 12 > 904-911
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新生界面陷阱对Fowler-Nordheim电压漂移的影响

谭长华 , 许铭真 and 王阳元

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    Received: 19 August 2015 Revised: Online: Published: 01 December 1989

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      Article Navigation >  Journal of Semiconductors  > 1989  >  10(12): 904-911
      谭长华, 许铭真, 王阳元. 新生界面陷阱对Fowler-Nordheim电压漂移的影响[J]. 半导体学报(英文版), 1989, 10(12): 904-911.
      Citation:
      谭长华, 许铭真, 王阳元. 新生界面陷阱对Fowler-Nordheim电压漂移的影响[J]. 半导体学报(英文版), 1989, 10(12): 904-911.
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      • Received Date: 2015-08-19

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