Chin. J. Semicond. > 2004, Volume 25 > Issue 9 > 1181-1185
|

CONTENTS

硅衬底上共面线的特性及应用

李富华 , 代文亮 , 李征帆 and 王玉洋

+ Author Affiliations

PDF

Key words: 共面线, 深亚微米CMOS集成电路, 高速限幅放大器

    • Search

    Advanced Search >>

    GET CITATION

    shu

    Export: BibTex EndNote

    Article Metrics

    Article views: 2567 Times PDF downloads: 1526 Times Cited by: 0 Times

    History

    Received: 19 August 2015 Revised: Online: Published: 01 September 2004

    Catalog

      Email This Article

      User name:
      Email:*请输入正确邮箱
      Code:*验证码错误
      Send
      Article Navigation >  Journal of Semiconductors  > 2004  >  25(9): 1181-1185
      李富华, 代文亮, 李征帆, 王玉洋. 硅衬底上共面线的特性及应用[J]. 半导体学报(英文版), 2004, 25(9): 1181-1185.
      Citation:
      李富华, 代文亮, 李征帆, 王玉洋. 硅衬底上共面线的特性及应用[J]. 半导体学报(英文版), 2004, 25(9): 1181-1185.
      shu

      • Received Date: 2015-08-19

      Catalog

        Journal of Semiconductors © 2017 All Rights Reserved   京ICP备05085259号-2

        /

        DownLoad:  Full-Size Img  PowerPoint
        Return
        Return