Chin. J. Semicond. > 2002, Volume 23 > Issue 7 > 777-781
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新型半导体清洗剂的清洗工艺

曹宝成 , 于新好 and 马洪磊

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Key words: 红外吸收谱, X射线光电子谱, 清洗工艺

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    Received: 19 August 2015 Revised: Online: Published: 01 July 2002

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      Article Navigation >  Journal of Semiconductors  > 2002  >  23(7): 777-781
      曹宝成, 于新好, 马洪磊. 新型半导体清洗剂的清洗工艺[J]. 半导体学报(英文版), 2002, 23(7): 777-781.
      Citation:
      曹宝成, 于新好, 马洪磊. 新型半导体清洗剂的清洗工艺[J]. 半导体学报(英文版), 2002, 23(7): 777-781.
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      • Received Date: 2015-08-19

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