Chin. J. Semicond. > 1993, Volume 14 > Issue 9 > 579-584
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硼掺杂p-型半导体金刚石薄膜的气相合成及其掺杂行为的研究

于三 , 邹广田 and 金曾孙

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    Received: 20 August 2015 Revised: Online: Published: 01 September 1993

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      Article Navigation >  Journal of Semiconductors  > 1993  >  14(9): 579-584
      于三, 邹广田, 金曾孙. 硼掺杂p-型半导体金刚石薄膜的气相合成及其掺杂行为的研究[J]. 半导体学报(英文版), 1993, 14(9): 579-584.
      Citation:
      于三, 邹广田, 金曾孙. 硼掺杂p-型半导体金刚石薄膜的气相合成及其掺杂行为的研究[J]. 半导体学报(英文版), 1993, 14(9): 579-584.
      shu

      • Received Date: 2015-08-20

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