Chin. J. Semicond. > 2002, Volume 23 > Issue 7 > 766-771
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一种快速光刻模拟中二维成像轮廓提取的新方法

陈志锦 , 史峥 , 王国雄 , 付萍 and 严晓浪

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Key words: 光学邻近校正(OPC), 光刻模拟, 二维轮廓提取

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    Received: 19 August 2015 Revised: Online: Published: 01 July 2002

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      Article Navigation >  Journal of Semiconductors  > 2002  >  23(7): 766-771
      陈志锦, 史峥, 王国雄, 付萍, 严晓浪. 一种快速光刻模拟中二维成像轮廓提取的新方法[J]. 半导体学报(英文版), 2002, 23(7): 766-771.
      Citation:
      陈志锦, 史峥, 王国雄, 付萍, 严晓浪. 一种快速光刻模拟中二维成像轮廓提取的新方法[J]. 半导体学报(英文版), 2002, 23(7): 766-771.
      shu

      • Received Date: 2015-08-19

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