Chin. J. Semicond. > 2003, Volume 24 > Issue S1 > 221-225
|

Proximity Effect Correction Technique in Electron-Beam Direct Writing

Chen Baogin, Ren Liming, Liu Ming, Wang Yunxiang, Long Shibing, Lu Jing and Li Ling

+ Author Affiliations

PDF

Abstract: The electron scattering processes are simulated by Monte Carlo method. The production mechanism of proximity effect and effective approaches of proximity effect correction are inVestigated. The experimental results show that proximity effect is a comprehensive phenomenon. It can be reduced and expectant purpose of proximity effect correction can be achieved through optimizing processes.

Key words: nanometer features

    • Search

    Advanced Search >>

    GET CITATION

    shu

    Export: BibTex EndNote

    Article Metrics

    Article views: 1923 Times PDF downloads: 796 Times Cited by: 0 Times

    History

    Received: 16 March 2016 Revised: Online: Published: 01 January 2003

    Catalog

      Email This Article

      User name:
      Email:*请输入正确邮箱
      Code:*验证码错误
      Send
      Article Navigation >  Journal of Semiconductors  > 2003  >  24(S1): 221-225
      Chen Baogin, Ren Liming, Liu Ming, Wang Yunxiang, Long Shibing, Lu Jing, Li Ling. Proximity Effect Correction Technique in Electron-Beam Direct Writing[J]. Journal of Semiconductors, 2003, 24(S1): 221-225. ****Chen B, Ren L M, Liu M, Wang Y X, Long S B, Lu J, Li L. Proximity Effect Correction Technique in Electron-Beam Direct Writing[J]. Chin. J. Semicond., 2003, 24(S1): 221.
      Citation:
      Chen Baogin, Ren Liming, Liu Ming, Wang Yunxiang, Long Shibing, Lu Jing, Li Ling. Proximity Effect Correction Technique in Electron-Beam Direct Writing[J]. Journal of Semiconductors, 2003, 24(S1): 221-225. ****
      Chen B, Ren L M, Liu M, Wang Y X, Long S B, Lu J, Li L. Proximity Effect Correction Technique in Electron-Beam Direct Writing[J]. Chin. J. Semicond., 2003, 24(S1): 221.
      shu

      Proximity Effect Correction Technique in Electron-Beam Direct Writing

      • R&D Center of Microelectionics, The Chinese Academy of Sciences, Beijing 100029, China,Department of Microelectronics, Peking University, Beijing 100871, China,R&D Center of Microelectlonics, The Chinese Academy of Sciences, Beijing 100029, China,R&D Center of Microelectlonics, The Chinese Academy of Sciences, Beijing 100029, China,R&D Center of Microelectlonics, The Chinese Academy of Sciences, Beijing 100029, China,R&D Center of Microelectlonics, The Chinese Academy of Sciences, Beijing 100029, China and R&D Center of Microelectlonics, The Chinese Academy of Sciences, Beijing 100029, China

      • Received Date: 2016-03-16
      • Published Date: 2016-03-15

      Catalog

        Journal of Semiconductors © 2017 All Rights Reserved   京ICP备05085259号-2

        /

        DownLoad:  Full-Size Img  PowerPoint
        Return
        Return