Chin. J. Semicond. > 1994, Volume 15 > Issue 8 > 544-550
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CoSi_2薄膜形成过程中的反应机制

何杰，顾诠，陈维德，许振嘉

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    Received: 18 August 2015 Revised: Online: Published: 01 August 1994

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      Article Navigation >  Journal of Semiconductors  > 1994  >  15(8): 544-550
      何杰，顾诠，陈维德，许振嘉. CoSi_2薄膜形成过程中的反应机制[J]. 半导体学报(英文版), 1994, 15(8): 544-550.
      Citation:
      何杰，顾诠，陈维德，许振嘉. CoSi_2薄膜形成过程中的反应机制[J]. 半导体学报(英文版), 1994, 15(8): 544-550.
      shu

      • Received Date: 2015-08-18

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