Chin. J. Semicond. > 2001, Volume 22 > Issue 4 > 451-455
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Pt层对Ni/Si(100)固相反应NiSi薄膜高温稳定性的增强效应

韩永召 , 李炳宗 , 屈新萍 and 茹国平

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Key words: 热稳定性, 金属硅化物, 相变

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    Received: 20 August 2015 Revised: Online: Published: 01 April 2001

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      Article Navigation >  Journal of Semiconductors  > 2001  >  22(4): 451-455
      韩永召, 李炳宗, 屈新萍, 茹国平. Pt层对Ni/Si(100)固相反应NiSi薄膜高温稳定性的增强效应[J]. 半导体学报(英文版), 2001, 22(4): 451-455.
      Citation:
      韩永召, 李炳宗, 屈新萍, 茹国平. Pt层对Ni/Si(100)固相反应NiSi薄膜高温稳定性的增强效应[J]. 半导体学报(英文版), 2001, 22(4): 451-455.
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      • Received Date: 2015-08-20

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