Chin. J. Semicond. > 2001, Volume 22 > Issue 4 > 451-455
|

CONTENTS

Pt层对Ni/Si(100)固相反应NiSi薄膜高温稳定性的增强效应

韩永召 , 李炳宗 , 屈新萍 and 茹国平

+ Author Affiliations

PDF

Key words: 热稳定性, 金属硅化物, 相变

    • Search

    Advanced Search >>

    GET CITATION

    shu

    Export: BibTex EndNote

    Article Metrics

    Article views: 2528 Times PDF downloads: 1080 Times Cited by: 0 Times

    History

    Received: 20 August 2015 Revised: Online: Published: 01 April 2001

    Catalog

      Email This Article

      User name:
      Email:*请输入正确邮箱
      Code:*验证码错误
      Send
      Article Navigation >  Journal of Semiconductors  > 2001  >  22(4): 451-455
      韩永召, 李炳宗, 屈新萍, 茹国平. Pt层对Ni/Si(100)固相反应NiSi薄膜高温稳定性的增强效应[J]. 半导体学报(英文版), 2001, 22(4): 451-455.
      Citation:
      韩永召, 李炳宗, 屈新萍, 茹国平. Pt层对Ni/Si(100)固相反应NiSi薄膜高温稳定性的增强效应[J]. 半导体学报(英文版), 2001, 22(4): 451-455.
      shu

      • Received Date: 2015-08-20

      Catalog

        Journal of Semiconductors © 2017 All Rights Reserved   京ICP备05085259号-2

        /

        DownLoad:  Full-Size Img  PowerPoint
        Return
        Return