| Citation: |
Wang Deqiang, Cao Leifeng, Xie Changqing, Ye Tianchun. Fabrication of Micro Zone Plates by E-Beam and X-Ray Lithography[J]. Journal of Semiconductors, 2006, 27(6): 1147.
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Wang D Q, Cao L F, Xie C Q, Ye T C. Fabrication of Micro Zone Plates by E-Beam and X-Ray Lithography[J]. Chin. J. Semicond., 2006, 27(6): 1147.
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Fabrication of Micro Zone Plates by E-Beam and X-Ray Lithography
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Abstract
This paper introduces a method for fabricating state-of-the-art micro-zone plates(MZP) on free-standing silicon nitride based on silicon using electron beam lithography and positive resist ZEP 520A.A bright field MZP master mask with an outermost width of 150nm is fabricated with an e-beam machine.In order to get the dark field high aspect ratio and the batch product of the MZP,we replicate the MZP mask by using synchrotron radiation X-ray lithography(XRL).Finally,we successfully replicate an MZP for an ICF diagnostics experiment.-
Keywords:
- e-beam,
- XRL,
- micro zone plates,
- Fresnel zone plates
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References
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Proportional views
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