Chin. J. Semicond. > 1995, Volume 16 > Issue 1 > 19-25
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多孔硅的微观结构及其氧化特性

黄宜平，郑大卫，李爱珍，汤庭鳌，崔堑，张翔九

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    Received: 19 August 2015 Revised: Online: Published: 01 January 1995

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      Article Navigation >  Journal of Semiconductors  > 1995  >  16(1): 19-25
      黄宜平，郑大卫，李爱珍，汤庭鳌，崔堑，张翔九. 多孔硅的微观结构及其氧化特性[J]. 半导体学报(英文版), 1995, 16(1): 19-25.
      Citation:
      黄宜平，郑大卫，李爱珍，汤庭鳌，崔堑，张翔九. 多孔硅的微观结构及其氧化特性[J]. 半导体学报(英文版), 1995, 16(1): 19-25.
      shu

      • Received Date: 2015-08-19

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