Chin. J. Semicond. > 2000, Volume 21 > Issue 7 > 673-676
|

CONTENTS

在硅衬底上用HFCVD法生长的纳米SiC薄膜及其室温光致发光

余明斌 , 马剑平 , 罗家骏 and 陈治明

+ Author Affiliations

PDF

Key words: 纳米材料, 碳化硅, 薄膜, 光致发光

    • Search

    Advanced Search >>

    GET CITATION

    shu

    Export: BibTex EndNote

    Article Metrics

    Article views: 2586 Times PDF downloads: 1370 Times Cited by: 0 Times

    History

    Received: 20 August 2015 Revised: Online: Published: 01 July 2000

    Catalog

      Email This Article

      User name:
      Email:*请输入正确邮箱
      Code:*验证码错误
      Send
      Article Navigation >  Journal of Semiconductors  > 2000  >  21(7): 673-676
      余明斌, 马剑平, 罗家骏, 陈治明. 在硅衬底上用HFCVD法生长的纳米SiC薄膜及其室温光致发光[J]. 半导体学报(英文版), 2000, 21(7): 673-676.
      Citation:
      余明斌, 马剑平, 罗家骏, 陈治明. 在硅衬底上用HFCVD法生长的纳米SiC薄膜及其室温光致发光[J]. 半导体学报(英文版), 2000, 21(7): 673-676.
      shu

      • Received Date: 2015-08-20

      Catalog

        Journal of Semiconductors © 2017 All Rights Reserved   京ICP备05085259号-2

        /

        DownLoad:  Full-Size Img  PowerPoint
        Return
        Return