Citation: |
Ali Ahaitouf, Abdelaziz Ahaitouf, Jean Paul Salvestrini, Hussein Srour. Accurate surface potential determination in Schottky diodes by the use of a correlated current and capacitance voltage measurements. Application to n-InP[J]. Journal of Semiconductors, 2011, 32(10): 104002. doi: 10.1088/1674-4926/32/10/104002
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A Ahaitouf, A Ahaitouf, J P Salvestrini, H Srour. Accurate surface potential determination in Schottky diodes by the use of a correlated current and capacitance voltage measurements. Application to n-InP[J]. J. Semicond., 2011, 32(10): 104002. doi: 10.1088/1674-4926/32/10/104002.
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Accurate surface potential determination in Schottky diodes by the use of a correlated current and capacitance voltage measurements. Application to n-InP
DOI: 10.1088/1674-4926/32/10/104002
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Abstract
Based on current voltage (I-Vg) and capacitance voltage (C-Vg) measurements, a reliable procedure is proposed to determine the effective surface potential Vd.Vg/ in Schottky diodes. In the framework of thermionic emission, our analysis includes both the effect of the series resistance and the ideality factor, even voltage dependent. This technique is applied to n-type indium phosphide (n-InP) Schottky diodes with and without an interfacial layer and allows us to provide an interpretation of the observed peak on the C-Vg measurements. The study clearly shows that the depletion width and the flat band barrier height deduced from C-Vg, which are important parameters directly related to the surface potential in the semiconductor, should be estimated within our approach to obtain more reliable information. -
References
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