Fig. 1.
The schematic diagram of slurry coating process with self-exposure.
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| Citation: |
Linsong Zhou, Haibo Rao, Wei Wang, Xianlong Wan, Junyuan Liao, Xuemei Wang, Da Zhou, Qiaolin Lei. Self-adaptive phosphor coating technology for wafer-level scale chip packaging[J]. Journal of Semiconductors, 2013, 34(5): 054010. doi: 10.1088/1674-4926/34/5/054010
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L S Zhou, H B Rao, W Wang, X L Wan, J Y Liao, X M Wang, D Zhou, Q L Lei. Self-adaptive phosphor coating technology for wafer-level scale chip packaging[J]. J. Semicond., 2013, 34(5): 054010. doi: 10.1088/1674-4926/34/5/054010.
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Self-adaptive phosphor coating technology for wafer-level scale chip packaging
DOI: 10.1088/1674-4926/34/5/054010
More Information
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Abstract
A new self-adaptive phosphor coating technology has been successfully developed, which adopted a slurry method combined with a self-exposure process. A phosphor suspension in the water-soluble photoresist was applied and exposed to LED blue light itself and developed to form a conformal phosphor coating with self-adaptability to the angular distribution of intensity of blue light and better-performing spatial color uniformity. The self-adaptive phosphor coating technology had been successfully adopted in the wafer surface to realize a wafer-level scale phosphor conformal coating. The first-stage experiments show satisfying results and give an adequate demonstration of the flexibility of self-adaptive coating technology on application of WLSCP. -
References
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