Citation: |
Yingbo Zhao, Gang Dong, Yintang Yang. Analysis and optimization of TSV-TSV coupling in three-dimensional integrated circuits[J]. Journal of Semiconductors, 2015, 36(4): 045011. doi: 10.1088/1674-4926/36/4/045011
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Y B Zhao, G Dong, Y T Yang. Analysis and optimization of TSV-TSV coupling in three-dimensional integrated circuits[J]. J. Semicond., 2015, 36(4): 045011. doi: 10.1088/1674-4926/36/4/045011.
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Analysis and optimization of TSV-TSV coupling in three-dimensional integrated circuits
DOI: 10.1088/1674-4926/36/4/045011
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Abstract
Through silicon via (TSV)-TSV coupling is detrimental to the performance of three-dimensional (3D) integrated circuits (ICs) with the major negative effect of introducing coupling noise. In order to obtain an accurate estimation of the coupling level from TSV-TSV in the early design stage, this paper first proposes an impedance-level model of the coupling channel between TSVs based on a two-port network, and then derives the formula of the coupling coefficient to describe the TSV-TSV coupling effect. The accuracy of the formula is validated by comparing the results with 3D full-wave simulations. Furthermore, a design technique for optimizing the coupling between adjacent coupled signal TSVs is proposed. Through SPICE simulations, the proposed technique shows its feasibility to reduce the coupling noise for both a simple TSV-TSV circuit and a complicated circuit with more TSVs, and demonstrates its potential for designers in achieving the goal of improving the electrical performance of 3D ICs. -
References
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