Chin. J. Semicond. > 1984, Volume 5 > Issue 6 > 596-604
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蓝宝石-硅和尖晶石-硅界面层宽度的俄歇分析

佘觉觉 , 曹大年 , 王维明 , 昝育德 , 邓惠芳 , 王建华 and 郁元桓

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    Received: 20 August 2015 Revised: Online: Published: 01 June 1984

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      Article Navigation >  Journal of Semiconductors  > 1984  >  5(6): 596-604
      佘觉觉, 曹大年, 王维明, 昝育德, 邓惠芳, 王建华, 郁元桓. 蓝宝石-硅和尖晶石-硅界面层宽度的俄歇分析[J]. 半导体学报(英文版), 1984, 5(6): 596-604.
      Citation:
      佘觉觉, 曹大年, 王维明, 昝育德, 邓惠芳, 王建华, 郁元桓. 蓝宝石-硅和尖晶石-硅界面层宽度的俄歇分析[J]. 半导体学报(英文版), 1984, 5(6): 596-604.
      shu

      • Received Date: 2015-08-20

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