Chin. J. Semicond. > 1996, Volume 17 > Issue 5 > 380-385
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超净硅片表面化学清洗工艺的优化研究

叶志镇，姜小波，袁骏，李剑光

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    Received: 18 August 2015 Revised: Online: Published: 01 May 1996

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      Article Navigation >  Journal of Semiconductors  > 1996  >  17(5): 380-385
      叶志镇，姜小波，袁骏，李剑光. 超净硅片表面化学清洗工艺的优化研究[J]. 半导体学报(英文版), 1996, 17(5): 380-385.
      Citation:
      叶志镇，姜小波，袁骏，李剑光. 超净硅片表面化学清洗工艺的优化研究[J]. 半导体学报(英文版), 1996, 17(5): 380-385.
      shu

      • Received Date: 2015-08-18

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