Chin. J. Semicond. > 1984, Volume 5 > Issue 6 > 676-678
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磷砷化镓离子注入层的CW CO_2激光退火研究

马景林 , 周瑞英 , 李国辉 and 阎凤章

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    Received: 20 August 2015 Revised: Online: Published: 01 June 1984

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      Article Navigation >  Journal of Semiconductors  > 1984  >  5(6): 676-678
      马景林, 周瑞英, 李国辉, 阎凤章. 磷砷化镓离子注入层的CW CO_2激光退火研究[J]. 半导体学报(英文版), 1984, 5(6): 676-678.
      Citation:
      马景林, 周瑞英, 李国辉, 阎凤章. 磷砷化镓离子注入层的CW CO_2激光退火研究[J]. 半导体学报(英文版), 1984, 5(6): 676-678.
      shu

      • Received Date: 2015-08-20

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