Chin. J. Semicond. > 2005, Volume 26 > Issue 6 > 1073-1076

Two Steps B Ion-Implantation of Diamond Film Grown on an n-Type Si Substrate and Its p-n Junction Effects

Sun Xiuping，Feng Kecheng，Li Chao and Zhang Hongxia，and Fei Yunjie

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Key words: ion implantation, diamond film, p-n junction

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Received: 19 August 2015 Revised: Online: Published: 01 June 2005

Article Navigation > Journal of Semiconductors > 2005 > 26(6): 1073-1076

Sun Xiuping，Feng Kecheng，Li Chao, Zhang Hongxia，and Fei Yunjie. Two Steps B Ion-Implantation of Diamond Film Grown on an n-Type Si Substrate and Its p-n Junction Effects[J]. 半导体学报(英文版), 2005, 26(6): 1073-1076.

Citation:

Sun Xiuping，Feng Kecheng，Li Chao, Zhang Hongxia，and Fei Yunjie. Two Steps B Ion-Implantation of Diamond Film Grown on an n-Type Si Substrate and Its p-n Junction Effects[J]. 半导体学报(英文版), 2005, 26(6): 1073-1076.

Sun Xiuping，Feng Kecheng，Li Chao, Zhang Hongxia，and Fei Yunjie. Two Steps B Ion-Implantation of Diamond Film Grown on an n-Type Si Substrate and Its p-n Junction Effects[J]. 半导体学报(英文版), 2005, 26(6): 1073-1076.

Citation:

Sun Xiuping，Feng Kecheng，Li Chao, Zhang Hongxia，and Fei Yunjie. Two Steps B Ion-Implantation of Diamond Film Grown on an n-Type Si Substrate and Its p-n Junction Effects[J]. 半导体学报(英文版), 2005, 26(6): 1073-1076.

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