Chin. J. Semicond. > 2001, Volume 22 > Issue 2 > 151-155
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聚焦离子束刻蚀性能的研究

谢进 , 江素华 , 王家楫 , 唐雷钧 and 宗祥福

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Key words: 聚焦离子束, 集成电路, 刻蚀, 溅射

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    Received: 19 August 2015 Revised: Online: Published: 01 February 2001

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      Article Navigation >  Journal of Semiconductors  > 2001  >  22(2): 151-155
      谢进, 江素华, 王家楫, 唐雷钧, 宗祥福. 聚焦离子束刻蚀性能的研究[J]. 半导体学报(英文版), 2001, 22(2): 151-155.
      Citation:
      谢进, 江素华, 王家楫, 唐雷钧, 宗祥福. 聚焦离子束刻蚀性能的研究[J]. 半导体学报(英文版), 2001, 22(2): 151-155.
      shu

      • Received Date: 2015-08-19

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