Chin. J. Semicond. > 2006, Volume 27 > Issue 9 > 1640-1644

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Fabrication of a High Quality Etching Mask for Two-Dimensional Photonic Crystal Structures

Du Wei, Xu Xingsheng, Han Weihua, Wang Chunxia, Zhang Yang, Yang Fuhua and Chen Hongda

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Abstract: The influence of different fabrication parameters on polymethyl methacrylate (PMMA) etching mask for two-dimensional photonic crystal structures are studied.The results show that high quality PMMA etching mask can be realized by optimizing parameters such as PMMA thickness,electron beam exposure dose,developing time,and fixation time.

Key words: photonic crystalelectron-beam lithographyPMMA mask

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    Received: 18 August 2015 Revised: 20 March 2006 Online: Published: 01 September 2006

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      Du Wei, Xu Xingsheng, Han Weihua, Wang Chunxia, Zhang Yang, Yang Fuhua, Chen Hongda. Fabrication of a High Quality Etching Mask for Two-Dimensional Photonic Crystal Structures[J]. Journal of Semiconductors, 2006, 27(9): 1640-1644. ****Du W, Xu X S, Han W H, Wang C X, Zhang Y, Yang F H, Chen H D. Fabrication of a High Quality Etching Mask for Two-Dimensional Photonic Crystal Structures[J]. Chin. J. Semicond., 2006, 27(9): 1640.
      Citation:
      Du Wei, Xu Xingsheng, Han Weihua, Wang Chunxia, Zhang Yang, Yang Fuhua, Chen Hongda. Fabrication of a High Quality Etching Mask for Two-Dimensional Photonic Crystal Structures[J]. Journal of Semiconductors, 2006, 27(9): 1640-1644. ****
      Du W, Xu X S, Han W H, Wang C X, Zhang Y, Yang F H, Chen H D. Fabrication of a High Quality Etching Mask for Two-Dimensional Photonic Crystal Structures[J]. Chin. J. Semicond., 2006, 27(9): 1640.

      Fabrication of a High Quality Etching Mask for Two-Dimensional Photonic Crystal Structures

      • Received Date: 2015-08-18
      • Accepted Date: 2006-03-08
      • Revised Date: 2006-03-20
      • Published Date: 2006-10-12

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