Chin. J. Semicond. > 1999, Volume 20 > Issue 10 > 862-866
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用于制备GaN的硅基ZnO过渡层的高温热处理研究

李剑光 , 叶志镇 , 汪雷 , 赵炳辉 , 袁骏 and 阙端麟

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    Received: 19 August 2015 Revised: Online: Published: 01 October 1999

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      Article Navigation >  Journal of Semiconductors  > 1999  >  20(10): 862-866
      李剑光, 叶志镇, 汪雷, 赵炳辉, 袁骏, 阙端麟. 用于制备GaN的硅基ZnO过渡层的高温热处理研究[J]. 半导体学报(英文版), 1999, 20(10): 862-866.
      Citation:
      李剑光, 叶志镇, 汪雷, 赵炳辉, 袁骏, 阙端麟. 用于制备GaN的硅基ZnO过渡层的高温热处理研究[J]. 半导体学报(英文版), 1999, 20(10): 862-866.
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      • Received Date: 2015-08-19

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