Chin. J. Semicond. > 2004, Volume 25 > Issue 7 > 884-888

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一种提高热氧化均匀度的方法

张霞

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Key words: 热氧化, 均匀度, 热传导, 匀流隔热散热装置

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    Received: 19 August 2015 Revised: Online: Published: 01 July 2004

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      Article Navigation >  Journal of Semiconductors  > 2004  >  25(7): 884-888
      张霞. 一种提高热氧化均匀度的方法[J]. 半导体学报(英文版), 2004, 25(7): 884-888.
      Citation:
      张霞. 一种提高热氧化均匀度的方法[J]. 半导体学报(英文版), 2004, 25(7): 884-888.
      shu

      • Received Date: 2015-08-19

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