Chin. J. Semicond. > 1996, Volume 17 > Issue 5 > 376-379
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高频溅射碳化硅薄膜的退火效应

陈伟，王玉霞，蔡维理，汤洪高，石磊，卢江，胡克良，周贵恩，赵亚盾，钱逸泰

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    Received: 18 August 2015 Revised: Online: Published: 01 May 1996

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      Article Navigation >  Journal of Semiconductors  > 1996  >  17(5): 376-379
      陈伟，王玉霞，蔡维理，汤洪高，石磊，卢江，胡克良，周贵恩，赵亚盾，钱逸泰. 高频溅射碳化硅薄膜的退火效应[J]. 半导体学报(英文版), 1996, 17(5): 376-379.
      Citation:
      陈伟，王玉霞，蔡维理，汤洪高，石磊，卢江，胡克良，周贵恩，赵亚盾，钱逸泰. 高频溅射碳化硅薄膜的退火效应[J]. 半导体学报(英文版), 1996, 17(5): 376-379.
      shu

      • Received Date: 2015-08-18

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